Heteroepitaxy and annealing studies of orthorhombic gallium oxide films on nanostructured AlN templates

Yara Banda, Seong Ho Cho, Yanqing Jia, Mohamed Ben Hassine, Bambar Davaasuren, Qingxiao Wang, Si Young Bae, Tien Khee Ng, Boon S. Ooi*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We report on the growth and characterization of κ-Ga2O3 films grown at varying temperatures in the range of 450-700 °C by mist-CVD. All of the films are single-crystalline and phase-pure except for the two samples grown at 550 °C and 600 °C, which have (2̅01)-oriented β-Ga2O3 incorporated in them. Unlike the phase-pure films which exhibit hexagonal-shaped grains, the mixed-phase samples have rough and partially coalesced films with irregular-shaped grains due to the presence of two Ga2O3 phases growing along two different crystallographic orientations. Moreover, we found that annealing the κ-Ga2O3 films at 700 °C in ambient air led to improved crystalline quality and reduced grain size.

Original languageEnglish (US)
Title of host publicationOxide-Based Materials and Devices XV
EditorsDavid J. Rogers, Ferechteh H. Teherani
PublisherSPIE
ISBN (Electronic)9781510670341
DOIs
StatePublished - 2024
EventOxide-Based Materials and Devices XV 2024 - San Francisco, United States
Duration: Jan 29 2024Feb 1 2024

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume12887
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceOxide-Based Materials and Devices XV 2024
Country/TerritoryUnited States
CitySan Francisco
Period01/29/2402/1/24

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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