Abstract
Herein, a selective passivation of p-GaN via hydrogen plasma treatment for InGaN single-quantum-well (SQW) red light-emitting diodes (LEDs) is reported. Insulating regions are formed on the p-GaN top surface via hydrogen plasma treatment, suppressing current injection beneath the p-pad and along the mesa perimeter to increase light output and mitigate non-radiative recombination. The fabricated LEDs demonstrate a high on-wafer light output power density of >88 mW cm−2, a peak on-wafer external quantum efficiency of 0.65%, and on-wafer wall-plug efficiency of 0.41% with a 645 nm peak emission wavelength at 10 mA (7.2 A cm−2) current injection. Further, the temperature dependence of InGaN SQW red LEDs is compared with their AlGaInP counterparts. InGaN SQW red LEDs exhibit a high characteristic temperature of 208 K and a small redshift coefficient of 0.072 nm K−1 at 72 A cm−2 current injection, which are almost 3 and 2 times better than the characteristics of AlGaInP red LEDs, respectively.
Original language | English (US) |
---|---|
Article number | 2400048 |
Journal | Physica Status Solidi (A) Applications and Materials Science |
Volume | 221 |
Issue number | 21 |
DOIs | |
State | Published - Nov 2024 |
Keywords
- AlGaInP
- characteristic temperatures
- hydrogen plasma treatments
- InGaN
- light-emitting diodes
- redshift coefficients
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering
- Materials Chemistry