Abstract
We demonstrate InAs quantum dot (QD) laser diodes epitaxially grown on exact (001) Si substrates by molecular beam epitaxy. Intentional 4-6 ° offcut substrates have been traditionally employed to avoid formations that stem from the interface between III-V and Si. However, offcut substrates are not fully compatible with the standard CMOS processing. In this work, we employed on-axis GaP/Si and V-groove Si substrates to enable high performance QD laser diodes with output power of more than ∼100 mW and continuous wave (CW) threshold current of ∼30 mA at room temperature (RT).
Original language | English (US) |
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Title of host publication | CS MANTECH 2017 - 2017 International Conference on Compound Semiconductor Manufacturing Technology |
Publisher | CS Mantech |
State | Published - Jan 1 2017 |
Externally published | Yes |