Investigating the optimum parameters of a negative photoresist to prepare a V-grooved diffraction grating on Si using photolithography and reactive ion etching techniques

Yas Al-Hadeethi, A. Al-Mujtabi, Fahd M. Al-Marzouki, Alaa Y. Mahmoud, Ahmad Umar, A. M. Abdel-Daiem, Mohammad Shahnawaze Ansari

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