Ion bombardment-induced enhancement of the properties of indium tin oxide films prepared by plasma-assisted reactive magnetron sputtering

M. Dudek; A. Amassian; O. Zabeida; J. E. Klemberg-Sapieha; L. Martinu

doi:10.1016/j.tsf.2009.01.012

Ion bombardment-induced enhancement of the properties of indium tin oxide films prepared by plasma-assisted reactive magnetron sputtering

M. Dudek, A. Amassian, O. Zabeida, J. E. Klemberg-Sapieha, L. Martinu^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

18 Scopus citations

Abstract

Research on tin doped indium oxide (ITO) has for many years been stimulated by the need to simultaneously optimize the electrical, optical and mechanical properties, and by new challenges related to the deposition of transparent conducting oxides on flexible plastic substrates. In the present work, we investigate the growth and optical, electrical, and mechanical (hardness, elastic modulus and stress) properties of ITO films deposited by plasma assisted reactive magnetron sputtering (PARMS) from an indium-tin alloy target. PARMS achieves an effective control of bombardment by reactive species (e.g., O₂⁺, O⁺) on the surface of the growing film by varying the bias voltage, V_B, induced by a radiofrequency power applied to the substrate. Stress-free films possessing high transparency (> 80% - film on glass) and low resistivity (4 × 10^{- 4} Ω cm) can be deposited by PARMS under conditions of intense ion bombardment (≤ 600 eV).

Original language	English (US)
Pages (from-to)	4576-4582
Number of pages	7
Journal	Thin Solid Films
Volume	517
Issue number	16
DOIs	https://doi.org/10.1016/j.tsf.2009.01.012
State	Published - Jun 30 2009
Externally published	Yes

Keywords

Electrical properties and measurements
Indium tin oxide
Ion bombardment
Optical coatings

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2009.01.012

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@article{b08fbfeb19ce4729b0b442e4efe7f5b1,

title = "Ion bombardment-induced enhancement of the properties of indium tin oxide films prepared by plasma-assisted reactive magnetron sputtering",

abstract = "Research on tin doped indium oxide (ITO) has for many years been stimulated by the need to simultaneously optimize the electrical, optical and mechanical properties, and by new challenges related to the deposition of transparent conducting oxides on flexible plastic substrates. In the present work, we investigate the growth and optical, electrical, and mechanical (hardness, elastic modulus and stress) properties of ITO films deposited by plasma assisted reactive magnetron sputtering (PARMS) from an indium-tin alloy target. PARMS achieves an effective control of bombardment by reactive species (e.g., O2+, O+) on the surface of the growing film by varying the bias voltage, VB, induced by a radiofrequency power applied to the substrate. Stress-free films possessing high transparency (> 80% - film on glass) and low resistivity (4 × 10- 4 Ω cm) can be deposited by PARMS under conditions of intense ion bombardment (≤ 600 eV).",

keywords = "Electrical properties and measurements, Indium tin oxide, Ion bombardment, Optical coatings",

author = "M. Dudek and A. Amassian and O. Zabeida and Klemberg-Sapieha, {J. E.} and L. Martinu",

year = "2009",

month = jun,

day = "30",

doi = "10.1016/j.tsf.2009.01.012",

language = "English (US)",

volume = "517",

pages = "4576--4582",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

number = "16",

}

TY - JOUR

T1 - Ion bombardment-induced enhancement of the properties of indium tin oxide films prepared by plasma-assisted reactive magnetron sputtering

AU - Dudek, M.

AU - Amassian, A.

AU - Zabeida, O.

AU - Klemberg-Sapieha, J. E.

AU - Martinu, L.

PY - 2009/6/30

Y1 - 2009/6/30

N2 - Research on tin doped indium oxide (ITO) has for many years been stimulated by the need to simultaneously optimize the electrical, optical and mechanical properties, and by new challenges related to the deposition of transparent conducting oxides on flexible plastic substrates. In the present work, we investigate the growth and optical, electrical, and mechanical (hardness, elastic modulus and stress) properties of ITO films deposited by plasma assisted reactive magnetron sputtering (PARMS) from an indium-tin alloy target. PARMS achieves an effective control of bombardment by reactive species (e.g., O2+, O+) on the surface of the growing film by varying the bias voltage, VB, induced by a radiofrequency power applied to the substrate. Stress-free films possessing high transparency (> 80% - film on glass) and low resistivity (4 × 10- 4 Ω cm) can be deposited by PARMS under conditions of intense ion bombardment (≤ 600 eV).

AB - Research on tin doped indium oxide (ITO) has for many years been stimulated by the need to simultaneously optimize the electrical, optical and mechanical properties, and by new challenges related to the deposition of transparent conducting oxides on flexible plastic substrates. In the present work, we investigate the growth and optical, electrical, and mechanical (hardness, elastic modulus and stress) properties of ITO films deposited by plasma assisted reactive magnetron sputtering (PARMS) from an indium-tin alloy target. PARMS achieves an effective control of bombardment by reactive species (e.g., O2+, O+) on the surface of the growing film by varying the bias voltage, VB, induced by a radiofrequency power applied to the substrate. Stress-free films possessing high transparency (> 80% - film on glass) and low resistivity (4 × 10- 4 Ω cm) can be deposited by PARMS under conditions of intense ion bombardment (≤ 600 eV).

KW - Electrical properties and measurements

KW - Indium tin oxide

KW - Ion bombardment

KW - Optical coatings

UR - http://www.scopus.com/inward/record.url?scp=65149085167&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2009.01.012

DO - 10.1016/j.tsf.2009.01.012

M3 - Article

AN - SCOPUS:65149085167

SN - 0040-6090

VL - 517

SP - 4576

EP - 4582

JO - Thin Solid Films

JF - Thin Solid Films

IS - 16

ER -

Ion bombardment-induced enhancement of the properties of indium tin oxide films prepared by plasma-assisted reactive magnetron sputtering

Abstract

Keywords

ASJC Scopus subject areas

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