Large-area nanoimprinting on various substrates by reconfigurable maskless laser direct writing

Engineering

• Multiphoton Lithography 100%
• Master Mold 66%
• Nanomaterial 33%
• Low-Temperature 33%
• Polydimethylsiloxane 33%
• One Step 33%
• Flexible Substrate 33%
• Etching Process 33%
• Si Wafer 33%
• Nanofabrication Process 33%
• Semiconductor Nanoparticles 33%
• Nanowires 33%
• Photoresist 33%
• Nanopillar 33%

Material Science

• Multiphoton Lithography 100%
• Nanofabrication Process 33%
• Flexible Substrate 33%
• Nanowires 33%
• Reactive Ion Etching 33%
• Semiconductor Nanoparticles 33%

Keyphrases

• Master Mold 50%
• Sub-micron Structures 25%
• Line Array 25%
• Mesh Array 25%