Abstract
Lateral orientated growth of In 2O 3 nanowire (NW) and nanorod (NR) arrays has been achieved by a vapor transport and condensation method on (001) and (111) surfaces of Si substrates. The single crystalline In 2O 3 NWs and NRs were grown along [21̄1̄] in parallel to the Si ±[11̄0] and lying in the substrate plane. The electrical measurements show that the In 2O 3 NWs are p-type semiconductor. By N + doping, the resistivity of the In 2O 3 NWs has been tuned. The lateral self-aligned In 2O 3 NW and NR arrays on Si can offer some unique advantages for fabricating parallel nanodevices that can be integrated directly with silicon technology.
Original language | English (US) |
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Pages (from-to) | 1799-1803 |
Number of pages | 5 |
Journal | Nano Letters |
Volume | 7 |
Issue number | 6 |
DOIs | |
State | Published - Jun 2007 |
Externally published | Yes |
ASJC Scopus subject areas
- Bioengineering
- General Chemistry
- General Materials Science
- Condensed Matter Physics
- Mechanical Engineering