Abstract
A layer-by-layer deposition method is presented for the fabrication of compact c-oriented-MCM-22/silica films on aluminum alloys and porous α-alumina discs. The film fabrication procedure combines deposition of platelike MCM-22 crystals on substrates by covalent attachment under reflux and/or by sonication-assisted covalent attachment (using the methods introduced by Yoon and co-workers and recently reviewed [Ace. Chem. Res. 2007, 40 (1), 29-40]) with evaporation-induced-self-assembly (EISA) of surfactant-templated silica. The composite c-oriented MCM-22/silica films exhibited corrosion resistance barrier properties comparable to commercial chromáte conversion coatings. Moreover, they exhibited hydrogen ideal selectivities (e.g., H 2/N 2 ∼7) above those expected by Knudsen diffusion indicating molecular sieving potential.
Original language | English (US) |
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Pages (from-to) | 7096-7106 |
Number of pages | 11 |
Journal | Industrial and Engineering Chemistry Research |
Volume | 46 |
Issue number | 22 |
DOIs | |
State | Published - Oct 24 2007 |
Externally published | Yes |
ASJC Scopus subject areas
- General Chemistry
- General Chemical Engineering
- Industrial and Manufacturing Engineering