Low damage reactive ion etching process for fabrication of ridge waveguide lasers

B. C. Qiu*, B. S. Ooi, A. C. Bryce, S. E. Hicks, C. D.W. Wilkinson, R. M. De La Rue, J. H. Marsh

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

6 Scopus citations

Fingerprint

Dive into the research topics of 'Low damage reactive ion etching process for fabrication of ridge waveguide lasers'. Together they form a unique fingerprint.

Keyphrases

Material Science