Abstract
We present a general optical metrology platform that employs an information processing metasurface as the means for the measurement of observables. The approach, consisting of combining an information processing metasurface with an off-the-shelf CMOS sensor, permits rapid characterization of the properties of materials in a cost-effective and mass-producible package. We present initial results on the fabrication of a prototype of this system.
Original language | English (US) |
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Pages | 1555-1556 |
Number of pages | 2 |
State | Published - 2023 |
Event | 13th International Conference on Metamaterials, Photonic Crystals and Plasmonics, META 2023 - Paris, France Duration: Jul 18 2023 → Jul 21 2023 |
Conference
Conference | 13th International Conference on Metamaterials, Photonic Crystals and Plasmonics, META 2023 |
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Country/Territory | France |
City | Paris |
Period | 07/18/23 → 07/21/23 |
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Materials Science (miscellaneous)
- Electronic, Optical and Magnetic Materials
- Materials Chemistry