Microfocusing optics for hard xrays fabricated by x-ray lithography

Azalia A. Krasnoperova*, Zheng Guo Chen, Franco Cerrina, E. Difabrizio, Massimo Gentili, Wenbing Yun, Barry P. Lai, Efim S. Gluskin

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Scopus citations


Lithographic techniques for fabrication of hard x-ray Fresnel zone plates are discussed. Practical results achieved at the Center for X-ray Lithography of the University of Wisconsin- Madison are presented. Fabrication technology includes replication of an e-beam written master mask into a thick photoresist by synchrotron radiation x-ray lithography, and subsequent electroplating of a metal zone plate structure using photoresist pattern as a mold.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Number of pages12
StatePublished - 1995
Externally publishedYes
EventX-Ray Microbeam Technology and Applications - San Diego, CA, USA
Duration: Jul 11 1995Jul 12 1995

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


OtherX-Ray Microbeam Technology and Applications
CitySan Diego, CA, USA

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Applied Mathematics
  • Electrical and Electronic Engineering
  • Computer Science Applications


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