TY - JOUR
T1 - Multi-scale graphene patterns on arbitrary substrates via laser-assisted transfer-printing process
AU - Park, J. B.
AU - Yoo, J.-H.
AU - Grigoropoulos, C. P.
N1 - KAUST Repository Item: Exported on 2020-10-01
Acknowledgements: This research work was financially supported by the King Abdullah Univesity of Science and Technology (KAUST). We would like to thank Professor Junqiao Wu's group from the Materials Science and Engineering Department of the University California, Berkeley for supporting the Raman scattering measurements.
This publication acknowledges KAUST support, but has no KAUST affiliated authors.
PY - 2012/7/24
Y1 - 2012/7/24
N2 - A laser-assisted transfer-printing process is developed for multi-scale graphene patterns on arbitrary substrates using femtosecond laser scanning on a graphene/metal substrate and transfer techniques without using multi-step patterning processes. The short pulse nature of a femtosecond laser on a graphene/copper sheet enables fabrication of high-resolution graphene patterns. Thanks to the scale up, fast, direct writing, multi-scale with high resolution, and reliable process characteristics, it can be an alternative pathway to the multi-step photolithography methods for printing arbitrary graphene patterns on desired substrates. We also demonstrate transparent strain devices without expensive photomasks and multi-step patterning process. © 2012 American Institute of Physics.
AB - A laser-assisted transfer-printing process is developed for multi-scale graphene patterns on arbitrary substrates using femtosecond laser scanning on a graphene/metal substrate and transfer techniques without using multi-step patterning processes. The short pulse nature of a femtosecond laser on a graphene/copper sheet enables fabrication of high-resolution graphene patterns. Thanks to the scale up, fast, direct writing, multi-scale with high resolution, and reliable process characteristics, it can be an alternative pathway to the multi-step photolithography methods for printing arbitrary graphene patterns on desired substrates. We also demonstrate transparent strain devices without expensive photomasks and multi-step patterning process. © 2012 American Institute of Physics.
UR - http://hdl.handle.net/10754/598902
UR - http://aip.scitation.org/doi/10.1063/1.4738883
UR - http://www.scopus.com/inward/record.url?scp=84864456915&partnerID=8YFLogxK
U2 - 10.1063/1.4738883
DO - 10.1063/1.4738883
M3 - Article
SN - 0003-6951
VL - 101
SP - 043110
JO - Applied Physics Letters
JF - Applied Physics Letters
IS - 4
ER -