Nanometer biodevice fabrication by electron beam lithography

Enzo Di Fabrizio; Luca Grella; Marco Baciocchi; Massimo Gentili; Cesare Ascoli; Brunero Cappella; Carlo Frediani; Piero Morales

doi:10.1116/1.589751

Nanometer biodevice fabrication by electron beam lithography

Enzo Di Fabrizio^*, Luca Grella, Marco Baciocchi, Massimo Gentili, Cesare Ascoli, Brunero Cappella, Carlo Frediani, Piero Morales

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

23 Scopus citations

Abstract

A conventional electron beam lithography machine operated at 50 kV is used in this work to fabricate devices and structures for biophysical and molecular electronics applications featuring critical dimensions down to the nanometer region. Such nanostructures are used for deposition and manipulation of organic molecules; fabricated devices include fine pitch self-standing meshes for laser deposition of molecules, a bimetallic miniaturized glucose sensor and nanogaps for molecular trapping and probing. The developed process is described in detail and by means of Monte Carlo simulation, the various electron scattering processes are modelled. Critical issues, such as fabrication of nanogaps with dimension down to 5 nm, are also addressed.

Original language	English (US)
Pages (from-to)	2892-2896
Number of pages	5
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	15
Issue number	6
DOIs	https://doi.org/10.1116/1.589751
State	Published - 1997
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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title = "Nanometer biodevice fabrication by electron beam lithography",

abstract = "A conventional electron beam lithography machine operated at 50 kV is used in this work to fabricate devices and structures for biophysical and molecular electronics applications featuring critical dimensions down to the nanometer region. Such nanostructures are used for deposition and manipulation of organic molecules; fabricated devices include fine pitch self-standing meshes for laser deposition of molecules, a bimetallic miniaturized glucose sensor and nanogaps for molecular trapping and probing. The developed process is described in detail and by means of Monte Carlo simulation, the various electron scattering processes are modelled. Critical issues, such as fabrication of nanogaps with dimension down to 5 nm, are also addressed.",

author = "{Di Fabrizio}, Enzo and Luca Grella and Marco Baciocchi and Massimo Gentili and Cesare Ascoli and Brunero Cappella and Carlo Frediani and Piero Morales",

year = "1997",

doi = "10.1116/1.589751",

language = "English (US)",

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AU - Di Fabrizio, Enzo

AU - Grella, Luca

AU - Baciocchi, Marco

AU - Gentili, Massimo

AU - Ascoli, Cesare

AU - Cappella, Brunero

AU - Frediani, Carlo

AU - Morales, Piero

PY - 1997

Y1 - 1997

N2 - A conventional electron beam lithography machine operated at 50 kV is used in this work to fabricate devices and structures for biophysical and molecular electronics applications featuring critical dimensions down to the nanometer region. Such nanostructures are used for deposition and manipulation of organic molecules; fabricated devices include fine pitch self-standing meshes for laser deposition of molecules, a bimetallic miniaturized glucose sensor and nanogaps for molecular trapping and probing. The developed process is described in detail and by means of Monte Carlo simulation, the various electron scattering processes are modelled. Critical issues, such as fabrication of nanogaps with dimension down to 5 nm, are also addressed.

AB - A conventional electron beam lithography machine operated at 50 kV is used in this work to fabricate devices and structures for biophysical and molecular electronics applications featuring critical dimensions down to the nanometer region. Such nanostructures are used for deposition and manipulation of organic molecules; fabricated devices include fine pitch self-standing meshes for laser deposition of molecules, a bimetallic miniaturized glucose sensor and nanogaps for molecular trapping and probing. The developed process is described in detail and by means of Monte Carlo simulation, the various electron scattering processes are modelled. Critical issues, such as fabrication of nanogaps with dimension down to 5 nm, are also addressed.

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JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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ER -

Nanometer biodevice fabrication by electron beam lithography

Abstract

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