Nanometer metrology by means of backscattered electrons

E. Di Fabrizio; L. Grella; M. Gentili; M. Baciocchi; L. Mastrogiacomo; R. Maggiora

doi:10.1116/1.588373

Nanometer metrology by means of backscattered electrons

E. Di Fabrizio^*, L. Grella, M. Gentili, M. Baciocchi, L. Mastrogiacomo, R. Maggiora

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

A computational and graphical algorithms for the extraction of metrological data on metal structures at the nanometer scale using an electron-beam machine were developed and compared. These two algorithms were used to prove the possibility of extracting linewidth measurements of the beam once the beam diameter is known. Comparison of electron-beam measurements and scanning-electron microscope measurements showed good agreement of results. The fulfillment of dimensional control requirements made e-beam machine one of most reliable tool for metrological studies at nanometer level.

Original language	English (US)
Pages (from-to)	321-326
Number of pages	6
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	13
Issue number	2
DOIs	https://doi.org/10.1116/1.588373
State	Published - Mar 1995
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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title = "Nanometer metrology by means of backscattered electrons",

abstract = "A computational and graphical algorithms for the extraction of metrological data on metal structures at the nanometer scale using an electron-beam machine were developed and compared. These two algorithms were used to prove the possibility of extracting linewidth measurements of the beam once the beam diameter is known. Comparison of electron-beam measurements and scanning-electron microscope measurements showed good agreement of results. The fulfillment of dimensional control requirements made e-beam machine one of most reliable tool for metrological studies at nanometer level.",

author = "{Di Fabrizio}, E. and L. Grella and M. Gentili and M. Baciocchi and L. Mastrogiacomo and R. Maggiora",

year = "1995",

month = mar,

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AU - Di Fabrizio, E.

AU - Grella, L.

AU - Gentili, M.

AU - Baciocchi, M.

AU - Mastrogiacomo, L.

AU - Maggiora, R.

PY - 1995/3

Y1 - 1995/3

N2 - A computational and graphical algorithms for the extraction of metrological data on metal structures at the nanometer scale using an electron-beam machine were developed and compared. These two algorithms were used to prove the possibility of extracting linewidth measurements of the beam once the beam diameter is known. Comparison of electron-beam measurements and scanning-electron microscope measurements showed good agreement of results. The fulfillment of dimensional control requirements made e-beam machine one of most reliable tool for metrological studies at nanometer level.

AB - A computational and graphical algorithms for the extraction of metrological data on metal structures at the nanometer scale using an electron-beam machine were developed and compared. These two algorithms were used to prove the possibility of extracting linewidth measurements of the beam once the beam diameter is known. Comparison of electron-beam measurements and scanning-electron microscope measurements showed good agreement of results. The fulfillment of dimensional control requirements made e-beam machine one of most reliable tool for metrological studies at nanometer level.

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M3 - Article

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SN - 0734-211X

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IS - 2

ER -

Nanometer metrology by means of backscattered electrons

Abstract

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