TY - JOUR
T1 - Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism
AU - Kryask, Marie
AU - Trikeriotis, Markos
AU - Ouyang, Christine
AU - Chakrabarty, Sovik
AU - Giannelis, Emmanuel P.
AU - Ober, Christopher K.
N1 - KAUST Repository Item: Exported on 2020-10-01
Acknowledgements: The authors gratefully acknowledge International SEMATECH for funding, as well as the Cornell Nanoscale Science and Technology Facility (CNF), Cornell Center of Materials Research (CCMR), the Nanobiotechnology Center (NBTC) and the KAUST-Cornell Center of Energy and Sustainability (KAUST-CU) for use of their facilities.Lawrence Berkeley National Laboratories was essential in our studies of EUV exposure.
This publication acknowledges KAUST support, but has no KAUST affiliated authors.
PY - 2013
Y1 - 2013
N2 - Hybrid nanoparticle photoresists and their patterning using DUV, EUV, 193 nm lithography and e-beam lithography has been investigated and reported earlier. The nanoparticles have demonstrated very high EUV sensitivity and significant etch resistance compared to other standard photoresists. The current study aims at investigating and establishing the underlying mechanism for dual tone patterning of these nanoparticle photoresist systems. Infrared spectroscopy and UV absorbance studies supported by mass loss and dissolution studies support the current model. © 2013SPST.
AB - Hybrid nanoparticle photoresists and their patterning using DUV, EUV, 193 nm lithography and e-beam lithography has been investigated and reported earlier. The nanoparticles have demonstrated very high EUV sensitivity and significant etch resistance compared to other standard photoresists. The current study aims at investigating and establishing the underlying mechanism for dual tone patterning of these nanoparticle photoresist systems. Infrared spectroscopy and UV absorbance studies supported by mass loss and dissolution studies support the current model. © 2013SPST.
UR - http://hdl.handle.net/10754/598941
UR - http://jlc.jst.go.jp/DN/JST.JSTAGE/photopolymer/26.659?lang=en&from=CrossRef&type=abstract
UR - http://www.scopus.com/inward/record.url?scp=84883711040&partnerID=8YFLogxK
U2 - 10.2494/photopolymer.26.659
DO - 10.2494/photopolymer.26.659
M3 - Article
SN - 0914-9244
VL - 26
SP - 659
EP - 664
JO - Journal of Photopolymer Science and Technology
JF - Journal of Photopolymer Science and Technology
IS - 5
ER -