The monolayers of dendritic polymers can be prepared by covalent attachment to a silicon wafer surface. These ultra-thin polymer films can serve as effective resists for high resolution lithography using the scanning probe microscope. These dendrimer films may be patterned using the scanning probe lithography (SPL) to create features with dimensions below 60 nm. Although very thin, the dendrimer films are resistant to an aqueous HF etch, allowing the production of a positive tone image as the patterned oxide relief features are selectively removed.
|Original language||English (US)|
|Number of pages||2|
|Journal||American Chemical Society, Polymer Preprints, Division of Polymer Chemistry|
|State||Published - Mar 1999|
ASJC Scopus subject areas
- Polymers and Plastics