Significant advances in the field of materials which may be useful as E-Beam or X-Ray resists have been made based on the development of new chain growth polymers such as the polysulfones and substituted polyacrylates. Over the past few years the authors have been interested in the design of new types of resist materials which generally possess high sensitivities due to structural features which allow for the occurrence of radiation initiated chain processes. One such example of 'chemical amplification' is the radiation induced depolymerization of poly(phtalaldehyde). A new approach to resist materials which operate on a somewhat similar design has been described. The system is based on a two-component mixture consisting of a polymer with thermally labile bonds in its main-chain and a substance which can generate acid by exposure to radiation (e. g. triarylsulfonium salts). Typical examples of the types of reactive polymers designed are polycarbonates shown.
|Title of host publication
|Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Material
|Number of pages
|Published - 1986
ASJC Scopus subject areas
- Chemical Engineering (miscellaneous)
- Polymers and Plastics