Nonpolar GaN layers grown by sidewall epitaxial lateral overgrowth: Optical evidences for a reduced stacking fault density

P. P. Paskov, B. Monemar, D. Iida, T. Kawashima, M. Iwaya, S. Kamiyama, H. Amano, I. Akasaki

Research output: Chapter in Book/Report/Conference proceedingConference contribution

13 Scopus citations

Abstract

Nonpolar a-plane and m-plane GaN layers grown by MOCVD employing sidewall epitaxial lateral overgrowth (SELO) are studied by photoluminescence (PL) and spatially resolved micro-PL. The effects of the groove orientations and the groove/terrace width ratio on the emission spectra, particularly on the stacking fault (SF) related emission bands in the 3.29-3.42 eV spectral region, are examined. The PL spectra of both types of nonpolar layers reveal a significant reduction of the defect related emissions when the grooves are oriented perpendicular to the c-axis of GaN and the groove/terrace width ratio is smaller than one. The suppression of SF formation in the areas where a lateral overgrowth along the [0001] GaN direction occurs is confirmed by micro-PL measurements showing no SF related emissions over the terrace regions. © 2008 Wiley-VCH Verlag GmbH & Co. KGaA.
Original languageEnglish (US)
Title of host publicationPhysica Status Solidi (C) Current Topics in Solid State Physics
Pages1768-1770
Number of pages3
DOIs
StatePublished - Dec 1 2008
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics

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