Novel concept for thin multi-crystalline silicon solar cell process

S. De Wolf*, H. F.W. Dekkers, G. Agostinelli, J. Szlufcik

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Solar cells on thin (≤150μm) multi-crystalline Si (mc-Si) substrates require diffusion lengths exceeding twice the substrate-thickness combined with an excellent rear-surface passivation in order to reach efficiencies above 16%. Moreover, thin substrates no longer allow the use of screenprinted Al for back-surface-field (BSF) and contact formation, due to excessive warping upon firing. Gettering originating from POCl3 emitter diffusion, is shown to enhance the bulk-quality to fulfill the first requirement. PECVD amorphous-Si (a-Si) layers, on the other hand, provide very low surface recombination rates. As a consequence, a POCl3 diffused front emitter, combined with a heterostructure a-Si / mc-Si rearside is suggested to overcome the several constraints present when shifting to the use of thinner substrates within a low-cost environment.

Original languageEnglish (US)
Title of host publicationProceddings of the 3rd World Conference on Photovoltaic Energy Conversion
EditorsK. Kurokawa, L.L. Kazmerski, B. McNeils, M. Yamaguchi, C. Wronski
Pages1316-1319
Number of pages4
StatePublished - 2003
Externally publishedYes
EventProceddings of the 3rd World Conference on Photovoltaic Energy Conversion - Osaka, Japan
Duration: May 11 2003May 18 2003

Publication series

NameProceedings of the 3rd World Conference on Photovoltaic Energy Conversion
VolumeB

Other

OtherProceddings of the 3rd World Conference on Photovoltaic Energy Conversion
Country/TerritoryJapan
CityOsaka
Period05/11/0305/18/03

ASJC Scopus subject areas

  • General Engineering

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