Novel photoresist design based on electrophilic aromatic substitution

B. Reck; R. D. Allen; R. J. Twieg; C. G. Willson; S. Matuszczak; H. D.H. Stover; N. H. Li; J. M.J. Frechet

Novel photoresist design based on electrophilic aromatic substitution

B. Reck^*, R. D. Allen, R. J. Twieg, C. G. Willson, S. Matuszczak, H. D.H. Stover, N. H. Li, J. M.J. Frechet

^*Corresponding author for this work

Research output: Contribution to conference › Paper › peer-review

4 Scopus citations

Abstract

A new approach to resist materials that exhibit chemical amplification is based on systems comprised of three structural units at least one of which is polymeric: (a) an aromatic moiety such as poly(4-hydroxystyrene), Novolac, or other aromatic compounds which are susceptible to electrophilic aromatic substitution; (b) a latent electrophile which may be polyfunctional and, in the case of this study, is a carbocation precursor; (c) a material which generates strong acid upon irradiation. Exposure of a film containing these three structural components affords a latent image of acid dispersed in the polymer matrix.

Original language	English (US)
Pages	63-72
Number of pages	10
State	Published - 1988
Externally published	Yes
Event	Photopolymers: Principles, Processes and Materials - Regional Technical Conference - Ellenville, NY, USA Duration: Oct 30 1988 → Nov 2 1988

Other

Other	Photopolymers: Principles, Processes and Materials - Regional Technical Conference
City	Ellenville, NY, USA
Period	10/30/88 → 11/2/88

ASJC Scopus subject areas

General Engineering

Cite this

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title = "Novel photoresist design based on electrophilic aromatic substitution",

abstract = "A new approach to resist materials that exhibit chemical amplification is based on systems comprised of three structural units at least one of which is polymeric: (a) an aromatic moiety such as poly(4-hydroxystyrene), Novolac, or other aromatic compounds which are susceptible to electrophilic aromatic substitution; (b) a latent electrophile which may be polyfunctional and, in the case of this study, is a carbocation precursor; (c) a material which generates strong acid upon irradiation. Exposure of a film containing these three structural components affords a latent image of acid dispersed in the polymer matrix.",

author = "B. Reck and Allen, {R. D.} and Twieg, {R. J.} and Willson, {C. G.} and S. Matuszczak and Stover, {H. D.H.} and Li, {N. H.} and Frechet, {J. M.J.}",

year = "1988",

language = "English (US)",

pages = "63--72",

note = "Photopolymers: Principles, Processes and Materials - Regional Technical Conference ; Conference date: 30-10-1988 Through 02-11-1988",

}

TY - CONF

T1 - Novel photoresist design based on electrophilic aromatic substitution

AU - Reck, B.

AU - Allen, R. D.

AU - Twieg, R. J.

AU - Willson, C. G.

AU - Matuszczak, S.

AU - Stover, H. D.H.

AU - Li, N. H.

AU - Frechet, J. M.J.

PY - 1988

Y1 - 1988

N2 - A new approach to resist materials that exhibit chemical amplification is based on systems comprised of three structural units at least one of which is polymeric: (a) an aromatic moiety such as poly(4-hydroxystyrene), Novolac, or other aromatic compounds which are susceptible to electrophilic aromatic substitution; (b) a latent electrophile which may be polyfunctional and, in the case of this study, is a carbocation precursor; (c) a material which generates strong acid upon irradiation. Exposure of a film containing these three structural components affords a latent image of acid dispersed in the polymer matrix.

AB - A new approach to resist materials that exhibit chemical amplification is based on systems comprised of three structural units at least one of which is polymeric: (a) an aromatic moiety such as poly(4-hydroxystyrene), Novolac, or other aromatic compounds which are susceptible to electrophilic aromatic substitution; (b) a latent electrophile which may be polyfunctional and, in the case of this study, is a carbocation precursor; (c) a material which generates strong acid upon irradiation. Exposure of a film containing these three structural components affords a latent image of acid dispersed in the polymer matrix.

UR - http://www.scopus.com/inward/record.url?scp=0024176286&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:0024176286

SP - 63

EP - 72

T2 - Photopolymers: Principles, Processes and Materials - Regional Technical Conference

Y2 - 30 October 1988 through 2 November 1988

ER -

Novel photoresist design based on electrophilic aromatic substitution

Abstract

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ASJC Scopus subject areas

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