Novel photoresist design based on electrophilic aromatic substitution

B. Reck^*, R. D. Allen, R. J. Twieg, C. G. Willson, S. Matuszczak, H. D.H. Stover, N. H. Li, J. M.J. Frechet

^*Corresponding author for this work

Research output: Contribution to conference › Paper › peer-review