Abstract
This paper studies the nucleation mechanism of the target-facing sputtering, and the variation of island-density with such parameters as deposition time and substrate temperature. This paper presents a simplified model of the nucleation and growth kinetics, and the results of the treatment based on this mode.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 115-119 |
| Number of pages | 5 |
| Journal | Tianjin Daxue Xuebao (Ziran Kexue yu Gongcheng Jishu Ban)/Journal of Tianjin University Science and Technology |
| Issue number | 3 |
| State | Published - 1988 |
| Externally published | Yes |
ASJC Scopus subject areas
- General