Abstract
We report statistical comparisons of lasing characteristics in InAs quantum dot (QD) micro-rings directly grown on on-axis (001) GaP/Si and V-groove (001) Si substrates. CW thresholds as low as 3 mA and high temperature operation exceeding 80 °C were simultaneously achieved on the GaP/Si template template with an outer-ring radius of 50 µm and a ring width of 4 μm, while a sub-milliamp threshold of 0.6 mA was demonstrated on the V-groove Si template with a smaller cavity size of 5-μm outer-ring radius and 3-μm ring width. Evaluations were also made with devices fabricated simultaneously on native GaAs substrates over a significant sampling analysis. The overall assessment spotlights compelling insights in exploring the optimum epitaxial scheme for low-threshold lasing on industry standard Si substrates.
Original language | English (US) |
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Pages (from-to) | 26853-26860 |
Number of pages | 8 |
Journal | Optics Express |
Volume | 25 |
Issue number | 22 |
DOIs | |
State | Published - Oct 30 2017 |
Externally published | Yes |
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics