TY - JOUR
T1 - Optical depth profiling of strontium titanate and electro-optic lanthanum-modified lead zirconium titanate multilayer structures for active waveguide applications
AU - Amassian, A.
AU - Gaidi, M.
AU - Chaker, M.
AU - Martinu, L.
N1 - Funding Information:
The authors wish to acknowledge the financial support by the Natural Sciences and Engineering Research Council (NSERC) of Canada and by VRQ-PROMPT of Québec. A.A. acknowledges the support from the NSERC Post-Graduate program.
PY - 2006/1
Y1 - 2006/1
N2 - Transparent polycrystalline strontium titanate (STO) and lanthanum-modified lead zirconium titanate (PLZT) thin films were deposited, respectively, on Si and on indium-doped tin oxide (ITO) coated glass by pulsed laser deposition (PLD). PLZT films are shown to exhibit electro-optic properties close to the bulk material when deposited on ITO in specific process conditions. The refractive index depth profile was determined by using a combination of variable angle spectroscopic ellipsometry and spectrophotometry, and the multisample analysis approach. PLZT films deposited at high O2 pressure, P O2, and annealed at 700 °C were found to be more porous and inhomogeneous than low P O2 films. The optical properties of STO films strongly depend on P O2 as well: low P O2 depositions lead to denser film growth with homogeneous, bulk-like refractive index profile, while high P O2 depositions lead to porous and highly inhomogeneous films, exhibiting band-gap variation and formation of a 60-nm -thick interdiffusion layer on Si. We use an optical depth-profiling procedure to investigate the formation of three-layer air/PLZT/STO/ITO/glass stacks, where the PLZT and STO optical properties are optimized by controlling P O2 during STO deposition, in order to form a cladding layer for potential active waveguide applications.
AB - Transparent polycrystalline strontium titanate (STO) and lanthanum-modified lead zirconium titanate (PLZT) thin films were deposited, respectively, on Si and on indium-doped tin oxide (ITO) coated glass by pulsed laser deposition (PLD). PLZT films are shown to exhibit electro-optic properties close to the bulk material when deposited on ITO in specific process conditions. The refractive index depth profile was determined by using a combination of variable angle spectroscopic ellipsometry and spectrophotometry, and the multisample analysis approach. PLZT films deposited at high O2 pressure, P O2, and annealed at 700 °C were found to be more porous and inhomogeneous than low P O2 films. The optical properties of STO films strongly depend on P O2 as well: low P O2 depositions lead to denser film growth with homogeneous, bulk-like refractive index profile, while high P O2 depositions lead to porous and highly inhomogeneous films, exhibiting band-gap variation and formation of a 60-nm -thick interdiffusion layer on Si. We use an optical depth-profiling procedure to investigate the formation of three-layer air/PLZT/STO/ITO/glass stacks, where the PLZT and STO optical properties are optimized by controlling P O2 during STO deposition, in order to form a cladding layer for potential active waveguide applications.
UR - http://www.scopus.com/inward/record.url?scp=29344460340&partnerID=8YFLogxK
U2 - 10.1116/1.2134710
DO - 10.1116/1.2134710
M3 - Article
AN - SCOPUS:29344460340
SN - 0734-2101
VL - 24
SP - 55
EP - 64
JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
IS - 1
ER -