Abstract
In this study, we employed bulk (0001) AlN substrates for the metalorganic chemical vapor deposition growth of AlGaN multi-quantum-well heterostructures in an Aixtron 6 × 2″ close-coupled showerhead reactor. The wafers were fabricated into cleaved bars with a cavity length of ∼1 mm. Two different layer structure designs are presented in this work. Both laser bars were optically pumped by a pulsed 193 nm ArF excimer laser at room temperature. The lasing wavelengths are 243.5 nm and 245.3 nm with threshold power density 427 kW/cm2 and 297 kW/cm2, respectively. Both laser bars showed transverse electric-polarization-dominated optical emission when operating above threshold.
Original language | English (US) |
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Pages (from-to) | 258-260 |
Number of pages | 3 |
Journal | Physica Status Solidi (C) Current Topics in Solid State Physics |
Volume | 11 |
Issue number | 2 |
DOIs | |
State | Published - Feb 2014 |
Externally published | Yes |
Keywords
- AlGaN
- III-nitride semiconductors
- Lasers
- MOCVD
- Metalorganic chemical vapor deposition
ASJC Scopus subject areas
- Condensed Matter Physics