Oxidative and carbonaceous patterning of Si surface in an organic media by scanning probe lithography

Matteo Lorenzoni; Andrea Giugni; Bruno Torre

doi:10.1186/1556-276X-8-75

Oxidative and carbonaceous patterning of Si surface in an organic media by scanning probe lithography

Matteo Lorenzoni^*, Andrea Giugni, Bruno Torre

^*Corresponding author for this work

Physical Sciences and Engineering

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Abstract

A simple top-down fabrication technique that involves scanning probe lithography on Si is presented. The writing procedure consists of a chemically selective patterning in mesitylene. Operating in an organic media is possible to perform local oxidation or solvent decomposition during the same pass by tuning the applied bias. The layer deposited with a positively biased tip with sub-100-nm lateral resolution consists of nanocrystalline graphite, as verified by Raman spectroscopy. The oxide pattern obtained in opposite polarization is later used as a mask for dry etching, showing a remarkable selectivity in SF₆plasma, to produce Si nanofeatured molds.

Original language	English (US)
Article number	75
Pages (from-to)	1-9
Number of pages	9
Journal	Nanoscale Research Letters
Volume	8
Issue number	1
DOIs	https://doi.org/10.1186/1556-276X-8-75
State	Published - 2013

Keywords

Dry etching mask
Nanocrystalline graphite
Scanning probe lithography

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics

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10.1186/1556-276X-8-75

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title = "Oxidative and carbonaceous patterning of Si surface in an organic media by scanning probe lithography",

abstract = "A simple top-down fabrication technique that involves scanning probe lithography on Si is presented. The writing procedure consists of a chemically selective patterning in mesitylene. Operating in an organic media is possible to perform local oxidation or solvent decomposition during the same pass by tuning the applied bias. The layer deposited with a positively biased tip with sub-100-nm lateral resolution consists of nanocrystalline graphite, as verified by Raman spectroscopy. The oxide pattern obtained in opposite polarization is later used as a mask for dry etching, showing a remarkable selectivity in SF6plasma, to produce Si nanofeatured molds.",

keywords = "Dry etching mask, Nanocrystalline graphite, Scanning probe lithography",

author = "Matteo Lorenzoni and Andrea Giugni and Bruno Torre",

note = "Funding Information: This work was entirely supported by the Italian Institute of Technology (IIT). We specially appreciate the support coming from the facilities of the Nanostructures Department.",

year = "2013",

doi = "10.1186/1556-276X-8-75",

language = "English (US)",

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T1 - Oxidative and carbonaceous patterning of Si surface in an organic media by scanning probe lithography

AU - Lorenzoni, Matteo

AU - Giugni, Andrea

AU - Torre, Bruno

N1 - Funding Information: This work was entirely supported by the Italian Institute of Technology (IIT). We specially appreciate the support coming from the facilities of the Nanostructures Department.

PY - 2013

Y1 - 2013

N2 - A simple top-down fabrication technique that involves scanning probe lithography on Si is presented. The writing procedure consists of a chemically selective patterning in mesitylene. Operating in an organic media is possible to perform local oxidation or solvent decomposition during the same pass by tuning the applied bias. The layer deposited with a positively biased tip with sub-100-nm lateral resolution consists of nanocrystalline graphite, as verified by Raman spectroscopy. The oxide pattern obtained in opposite polarization is later used as a mask for dry etching, showing a remarkable selectivity in SF6plasma, to produce Si nanofeatured molds.

AB - A simple top-down fabrication technique that involves scanning probe lithography on Si is presented. The writing procedure consists of a chemically selective patterning in mesitylene. Operating in an organic media is possible to perform local oxidation or solvent decomposition during the same pass by tuning the applied bias. The layer deposited with a positively biased tip with sub-100-nm lateral resolution consists of nanocrystalline graphite, as verified by Raman spectroscopy. The oxide pattern obtained in opposite polarization is later used as a mask for dry etching, showing a remarkable selectivity in SF6plasma, to produce Si nanofeatured molds.

KW - Dry etching mask

KW - Nanocrystalline graphite

KW - Scanning probe lithography

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U2 - 10.1186/1556-276X-8-75

DO - 10.1186/1556-276X-8-75

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AN - SCOPUS:84875177839

SN - 1931-7573

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JO - Nanoscale Research Letters

JF - Nanoscale Research Letters

IS - 1

M1 - 75

ER -

Oxidative and carbonaceous patterning of Si surface in an organic media by scanning probe lithography

Abstract

Keywords

ASJC Scopus subject areas

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