TY - GEN
T1 - Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning
AU - Chakrabarty, Souvik
AU - Ouyang, Christine
AU - Krysak, Marie
AU - Trikeriotis, Markos
AU - Cho, Kyoungyoung
AU - Giannelis, Emmanuel P.
AU - Ober, Christopher K.
N1 - KAUST Repository Item: Exported on 2020-10-01
Acknowledgements: The authors gratefully acknowledge SEMATECH for funding, as well as the Cornell Nanoscale Science and TechnologyFacility (CNF), Cornell Center of Materials Research (CCMR), the Nanobiotechnology Center (NBTC) and theKAUST-Cornell Center of Energy and Sustainability (KAUST_CU) for use of their facilities.
This publication acknowledges KAUST support, but has no KAUST affiliated authors.
PY - 2013/4/1
Y1 - 2013/4/1
N2 - DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions. © 2013 SPIE.
AB - DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions. © 2013 SPIE.
UR - http://hdl.handle.net/10754/599125
UR - http://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.2011490
UR - http://www.scopus.com/inward/record.url?scp=84878421312&partnerID=8YFLogxK
U2 - 10.1117/12.2011490
DO - 10.1117/12.2011490
M3 - Conference contribution
SN - 9780819494610
BT - Extreme Ultraviolet (EUV) Lithography IV
PB - SPIE-Intl Soc Optical Eng
ER -