TY - JOUR
T1 - p-Doping of Copper(I) Thiocyanate (CuSCN) Hole-Transport Layers for High-Performance Transistors and Organic Solar Cells
AU - Wijeyasinghe, Nilushi
AU - Eisner, Flurin
AU - Tsetseris, Leonidas
AU - Lin, Yen-Hung
AU - Seitkhan, Akmaral
AU - Li, Jinhua
AU - Yan, Feng
AU - Solomeshch, Olga
AU - Tessler, Nir
AU - Patsalas, Panos
AU - Anthopoulos, Thomas D.
N1 - KAUST Repository Item: Exported on 2020-10-01
Acknowledgements: N.W. and T.D.A. acknowledge financial support from the European Research Council (ERC) AMPRO (Grant No. 280221) and the Engineering and Physical Sciences Research Council (EPSRC) (Grant No. EP/L504786/1). The authors acknowledge the King Abdullah University of Science and Technology (KAUST) for the financial support. L.T. acknowledges support for the computational time granted from the Greek Research & Technology Network (GRNET) in the National HPC facility—ARIS—under project pr004034-STEM. O.S. acknowledges the support of the Israel Ministry of Science, the Center for Absorption in Science of the Ministry of Immigrant Absorption.
PY - 2018/6/3
Y1 - 2018/6/3
N2 - The ability to tune the electronic properties of soluble wide bandgap semiconductors is crucial for their successful implementation as carrier-selective interlayers in large area opto/electronics. Herein the simple, economical, and effective p-doping of one of the most promising transparent semiconductors, copper(I) thiocyanate (CuSCN), using C60F48 is reported. Theoretical calculations combined with experimental measurements are used to elucidate the electronic band structure and density of states of the constituent materials and their blends. Obtained results reveal that although the bandgap (3.85 eV) and valence band maximum (−5.4 eV) of CuSCN remain unaffected, its Fermi energy shifts toward the valence band edge upon C60F48 addition—an observation consistent with p-type doping. Transistor measurements confirm the p-doping effect while revealing a tenfold increase in the channel's hole mobility (up to 0.18 cm2 V−1 s−1), accompanied by a dramatic improvement in the transistor's bias-stress stability. Application of CuSCN:C60F48 as the hole-transport layer (HTL) in organic photovoltaics yields devices with higher power conversion efficiency, improved fill factor, higher shunt resistance, and lower series resistance and dark current, as compared to control devices based on pristine CuSCN or commercially available HTLs.
AB - The ability to tune the electronic properties of soluble wide bandgap semiconductors is crucial for their successful implementation as carrier-selective interlayers in large area opto/electronics. Herein the simple, economical, and effective p-doping of one of the most promising transparent semiconductors, copper(I) thiocyanate (CuSCN), using C60F48 is reported. Theoretical calculations combined with experimental measurements are used to elucidate the electronic band structure and density of states of the constituent materials and their blends. Obtained results reveal that although the bandgap (3.85 eV) and valence band maximum (−5.4 eV) of CuSCN remain unaffected, its Fermi energy shifts toward the valence band edge upon C60F48 addition—an observation consistent with p-type doping. Transistor measurements confirm the p-doping effect while revealing a tenfold increase in the channel's hole mobility (up to 0.18 cm2 V−1 s−1), accompanied by a dramatic improvement in the transistor's bias-stress stability. Application of CuSCN:C60F48 as the hole-transport layer (HTL) in organic photovoltaics yields devices with higher power conversion efficiency, improved fill factor, higher shunt resistance, and lower series resistance and dark current, as compared to control devices based on pristine CuSCN or commercially available HTLs.
UR - http://hdl.handle.net/10754/628266
UR - https://onlinelibrary.wiley.com/doi/full/10.1002/adfm.201802055
UR - http://www.scopus.com/inward/record.url?scp=85050996023&partnerID=8YFLogxK
U2 - 10.1002/adfm.201802055
DO - 10.1002/adfm.201802055
M3 - Article
SN - 1616-301X
VL - 28
SP - 1802055
JO - Advanced Functional Materials
JF - Advanced Functional Materials
IS - 31
ER -