Patterned magnetic permalloy and nickel films: Fabrication by electron beam and X-ray lithographic techniques

Patrizio Candeloro; Annamaria Gerardino; Enzo Di Fabrizio; Stefano Cabrini; Giorgio Giannini; Luigi Mastrogiacomo; Miguel Ciria; Robert C. O'Handley; Gianluca Gubbiotti; Giovanni Carlotti

doi:10.1143/jjap.41.5149

Patterned magnetic permalloy and nickel films: Fabrication by electron beam and X-ray lithographic techniques

Patrizio Candeloro^*, Annamaria Gerardino, Enzo Di Fabrizio, Stefano Cabrini, Giorgio Giannini, Luigi Mastrogiacomo, Miguel Ciria, Robert C. O'Handley, Gianluca Gubbiotti, Giovanni Carlotti

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

Electron beam (e-beam) and X-ray lithographic techniques have been used to fabricate permalloy (Ni₈₀Fe₂₀) and nickel rectangular and triangular dots and antidots on an area of (1 × 1) mm². Dot dimensions and spacings range from 500 nm to 1 μm and from 250 nm to 50 nm, respectively. The changes of the magnetic properties induced by patterning have been studied by means of magneto-optic Kerr effect (MOKE) magnetometry and the Brillouin light scattering (BLS) technique.

Original language	English (US)
Pages (from-to)	5149-5152
Number of pages	4
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	41
Issue number	8
DOIs	https://doi.org/10.1143/jjap.41.5149
State	Published - Aug 2002
Externally published	Yes

Keywords

Brillouin light scattering
Chemical amplified resists
E-beam and X-ray lithographies
Magneto-optic Kerr effect magnetometry

ASJC Scopus subject areas

General Engineering
General Physics and Astronomy

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10.1143/jjap.41.5149

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Candeloro, P., Gerardino, A., Di Fabrizio, E., Cabrini, S., Giannini, G., Mastrogiacomo, L., Ciria, M., O'Handley, R. C., Gubbiotti, G., & Carlotti, G. (2002). Patterned magnetic permalloy and nickel films: Fabrication by electron beam and X-ray lithographic techniques. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 41(8), 5149-5152. https://doi.org/10.1143/jjap.41.5149

@article{ce326d1ad7e44cc5ab6c55ea169a64a6,

title = "Patterned magnetic permalloy and nickel films: Fabrication by electron beam and X-ray lithographic techniques",

abstract = "Electron beam (e-beam) and X-ray lithographic techniques have been used to fabricate permalloy (Ni80Fe20) and nickel rectangular and triangular dots and antidots on an area of (1 × 1) mm2. Dot dimensions and spacings range from 500 nm to 1 μm and from 250 nm to 50 nm, respectively. The changes of the magnetic properties induced by patterning have been studied by means of magneto-optic Kerr effect (MOKE) magnetometry and the Brillouin light scattering (BLS) technique.",

keywords = "Brillouin light scattering, Chemical amplified resists, E-beam and X-ray lithographies, Magneto-optic Kerr effect magnetometry",

author = "Patrizio Candeloro and Annamaria Gerardino and {Di Fabrizio}, Enzo and Stefano Cabrini and Giorgio Giannini and Luigi Mastrogiacomo and Miguel Ciria and O'Handley, {Robert C.} and Gianluca Gubbiotti and Giovanni Carlotti",

year = "2002",

month = aug,

doi = "10.1143/jjap.41.5149",

language = "English (US)",

volume = "41",

pages = "5149--5152",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "8",

}

Candeloro, P, Gerardino, A, Di Fabrizio, E, Cabrini, S, Giannini, G, Mastrogiacomo, L, Ciria, M, O'Handley, RC, Gubbiotti, G & Carlotti, G 2002, 'Patterned magnetic permalloy and nickel films: Fabrication by electron beam and X-ray lithographic techniques', Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, vol. 41, no. 8, pp. 5149-5152. https://doi.org/10.1143/jjap.41.5149

Patterned magnetic permalloy and nickel films: Fabrication by electron beam and X-ray lithographic techniques. / Candeloro, Patrizio; Gerardino, Annamaria; Di Fabrizio, Enzo et al.
In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 41, No. 8, 08.2002, p. 5149-5152.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Patterned magnetic permalloy and nickel films

T2 - Fabrication by electron beam and X-ray lithographic techniques

AU - Candeloro, Patrizio

AU - Gerardino, Annamaria

AU - Di Fabrizio, Enzo

AU - Cabrini, Stefano

AU - Giannini, Giorgio

AU - Mastrogiacomo, Luigi

AU - Ciria, Miguel

AU - O'Handley, Robert C.

AU - Gubbiotti, Gianluca

AU - Carlotti, Giovanni

PY - 2002/8

Y1 - 2002/8

N2 - Electron beam (e-beam) and X-ray lithographic techniques have been used to fabricate permalloy (Ni80Fe20) and nickel rectangular and triangular dots and antidots on an area of (1 × 1) mm2. Dot dimensions and spacings range from 500 nm to 1 μm and from 250 nm to 50 nm, respectively. The changes of the magnetic properties induced by patterning have been studied by means of magneto-optic Kerr effect (MOKE) magnetometry and the Brillouin light scattering (BLS) technique.

AB - Electron beam (e-beam) and X-ray lithographic techniques have been used to fabricate permalloy (Ni80Fe20) and nickel rectangular and triangular dots and antidots on an area of (1 × 1) mm2. Dot dimensions and spacings range from 500 nm to 1 μm and from 250 nm to 50 nm, respectively. The changes of the magnetic properties induced by patterning have been studied by means of magneto-optic Kerr effect (MOKE) magnetometry and the Brillouin light scattering (BLS) technique.

KW - Brillouin light scattering

KW - Chemical amplified resists

KW - E-beam and X-ray lithographies

KW - Magneto-optic Kerr effect magnetometry

UR - http://www.scopus.com/inward/record.url?scp=0036698025&partnerID=8YFLogxK

U2 - 10.1143/jjap.41.5149

DO - 10.1143/jjap.41.5149

M3 - Article

AN - SCOPUS:0036698025

SN - 0021-4922

VL - 41

SP - 5149

EP - 5152

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

IS - 8

ER -

Patterned magnetic permalloy and nickel films: Fabrication by electron beam and X-ray lithographic techniques

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