Patterning layered polymeric multilayer films by room-temperature nanoimprint lithography

Yingxi Lu; Wei Hu; Ying Ma; Lianbin Zhang; Junqi Sun; Nan Lu; Jiacong Shen

doi:10.1002/marc.200500834

Patterning layered polymeric multilayer films by room-temperature nanoimprint lithography

Yingxi Lu, Wei Hu, Ying Ma, Lianbin Zhang, Junqi Sun^*, Nan Lu, Jiacong Shen

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

20 Scopus citations

Abstract

Polyelectrolyte multilayer films of poly(acrylic acid)(PAA)/ poly(allylammehydrochloritle) (PAH)andPAH/ poly(sodium4-styrenesulfonate)(PSS) based on electrostatic interactions as a driving force are patterned by room-temperature nanoimprint lithography (RT-NIL). Under an imprinting pressure of 40 bar for 8 rain, well-defined pattern structures with a line width of ≈ 330 nm and a separation of ≈ 413 nm are achieved. Meanwhile, hydrogen-bondmg-directed multilayer films of poly(vinyl pyrrolidone) (PVPON)/ poly(methyl acrylic acid) (PM AA) and poly(4-vinylpyridine)/ PAA can also be patterned in a similar way by RT-NIL. The successful imprinting of these films originates from the high compressibility and fluidity of the layered polymeric films under high pressure.

Original language	English (US)
Pages (from-to)	505-510
Number of pages	6
Journal	Macromolecular Rapid Communications
Volume	27
Issue number	7
DOIs	https://doi.org/10.1002/marc.200500834
State	Published - Apr 3 2006
Externally published	Yes

Keywords

Layer-by-layer assembly
Lithography
Multilayer films
Nanoimprint lithography
Pattern
Polyelectrolytes

ASJC Scopus subject areas

Polymers and Plastics
Organic Chemistry
Materials Chemistry

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10.1002/marc.200500834

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title = "Patterning layered polymeric multilayer films by room-temperature nanoimprint lithography",

abstract = "Polyelectrolyte multilayer films of poly(acrylic acid)(PAA)/ poly(allylammehydrochloritle) (PAH)andPAH/ poly(sodium4-styrenesulfonate)(PSS) based on electrostatic interactions as a driving force are patterned by room-temperature nanoimprint lithography (RT-NIL). Under an imprinting pressure of 40 bar for 8 rain, well-defined pattern structures with a line width of ≈ 330 nm and a separation of ≈ 413 nm are achieved. Meanwhile, hydrogen-bondmg-directed multilayer films of poly(vinyl pyrrolidone) (PVPON)/ poly(methyl acrylic acid) (PM AA) and poly(4-vinylpyridine)/ PAA can also be patterned in a similar way by RT-NIL. The successful imprinting of these films originates from the high compressibility and fluidity of the layered polymeric films under high pressure.",

keywords = "Layer-by-layer assembly, Lithography, Multilayer films, Nanoimprint lithography, Pattern, Polyelectrolytes",

author = "Yingxi Lu and Wei Hu and Ying Ma and Lianbin Zhang and Junqi Sun and Nan Lu and Jiacong Shen",

year = "2006",

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language = "English (US)",

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TY - JOUR

T1 - Patterning layered polymeric multilayer films by room-temperature nanoimprint lithography

AU - Lu, Yingxi

AU - Hu, Wei

AU - Ma, Ying

AU - Zhang, Lianbin

AU - Sun, Junqi

AU - Lu, Nan

AU - Shen, Jiacong

PY - 2006/4/3

Y1 - 2006/4/3

N2 - Polyelectrolyte multilayer films of poly(acrylic acid)(PAA)/ poly(allylammehydrochloritle) (PAH)andPAH/ poly(sodium4-styrenesulfonate)(PSS) based on electrostatic interactions as a driving force are patterned by room-temperature nanoimprint lithography (RT-NIL). Under an imprinting pressure of 40 bar for 8 rain, well-defined pattern structures with a line width of ≈ 330 nm and a separation of ≈ 413 nm are achieved. Meanwhile, hydrogen-bondmg-directed multilayer films of poly(vinyl pyrrolidone) (PVPON)/ poly(methyl acrylic acid) (PM AA) and poly(4-vinylpyridine)/ PAA can also be patterned in a similar way by RT-NIL. The successful imprinting of these films originates from the high compressibility and fluidity of the layered polymeric films under high pressure.

AB - Polyelectrolyte multilayer films of poly(acrylic acid)(PAA)/ poly(allylammehydrochloritle) (PAH)andPAH/ poly(sodium4-styrenesulfonate)(PSS) based on electrostatic interactions as a driving force are patterned by room-temperature nanoimprint lithography (RT-NIL). Under an imprinting pressure of 40 bar for 8 rain, well-defined pattern structures with a line width of ≈ 330 nm and a separation of ≈ 413 nm are achieved. Meanwhile, hydrogen-bondmg-directed multilayer films of poly(vinyl pyrrolidone) (PVPON)/ poly(methyl acrylic acid) (PM AA) and poly(4-vinylpyridine)/ PAA can also be patterned in a similar way by RT-NIL. The successful imprinting of these films originates from the high compressibility and fluidity of the layered polymeric films under high pressure.

KW - Layer-by-layer assembly

KW - Lithography

KW - Multilayer films

KW - Nanoimprint lithography

KW - Pattern

KW - Polyelectrolytes

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U2 - 10.1002/marc.200500834

DO - 10.1002/marc.200500834

M3 - Article

AN - SCOPUS:33645781108

SN - 1022-1336

VL - 27

SP - 505

EP - 510

JO - Macromolecular Rapid Communications

JF - Macromolecular Rapid Communications

IS - 7

ER -

Patterning layered polymeric multilayer films by room-temperature nanoimprint lithography

Abstract

Keywords

ASJC Scopus subject areas

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