Patterning layered polymeric multilayer films by room-temperature nanoimprint lithography

Yingxi Lu, Wei Hu, Ying Ma, Lianbin Zhang, Junqi Sun*, Nan Lu, Jiacong Shen

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

20 Scopus citations


Polyelectrolyte multilayer films of poly(acrylic acid)(PAA)/ poly(allylammehydrochloritle) (PAH)andPAH/ poly(sodium4-styrenesulfonate)(PSS) based on electrostatic interactions as a driving force are patterned by room-temperature nanoimprint lithography (RT-NIL). Under an imprinting pressure of 40 bar for 8 rain, well-defined pattern structures with a line width of ≈ 330 nm and a separation of ≈ 413 nm are achieved. Meanwhile, hydrogen-bondmg-directed multilayer films of poly(vinyl pyrrolidone) (PVPON)/ poly(methyl acrylic acid) (PM AA) and poly(4-vinylpyridine)/ PAA can also be patterned in a similar way by RT-NIL. The successful imprinting of these films originates from the high compressibility and fluidity of the layered polymeric films under high pressure.

Original languageEnglish (US)
Pages (from-to)505-510
Number of pages6
JournalMacromolecular Rapid Communications
Issue number7
StatePublished - Apr 3 2006
Externally publishedYes


  • Layer-by-layer assembly
  • Lithography
  • Multilayer films
  • Nanoimprint lithography
  • Pattern
  • Polyelectrolytes

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry


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