Abstract
The application of hyperbranched polymers as a chemically amplified resist system for exposure by electron-beam (e-beam) is described. These materials incorporate acid labile tert-butyl carbonates (t-BOC) groups on the periphery as the imagable functionality. Exposure by e-beam and subsequent imaging in both the positive and negative tone has been accomplished. Continuous patterns with square profiles and line widths of 100 nm have been patterned in the negative tone. Unfortunately, this particular resist exhibits poor adhesion, and attempts to improve the adhesion have thus far been unsuccessful.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 325-326 |
| Number of pages | 2 |
| Journal | American Chemical Society, Polymer Preprints, Division of Polymer Chemistry |
| Volume | 41 |
| Issue number | 1 |
| State | Published - Mar 2000 |
| Externally published | Yes |
| Event | The San Francisco Meeting - San Francisco, CA, USA Duration: Mar 26 2000 → Mar 31 2000 |
ASJC Scopus subject areas
- Polymers and Plastics