TY - GEN
T1 - Performance analysis of optimized carbon nanotube interconnect
AU - Massoud, Yehia
AU - Nieuwoudt, Arthur
N1 - Generated from Scopus record by KAUST IRTS on 2022-09-13
PY - 2008/9/19
Y1 - 2008/9/19
N2 - As CMOS technology is pushed to its basic physical limits, alternate technologies are required for the realization of interconnect in future high performance integrated circuits. In this paper, we develop a generalized design technique for carbon nanotube (CNT) bundle-based interconnect, which we use to examine the performance limits and fabrication requirements for future nanotube-based interconnect solutions. The results indicate that optimized nanotube bundles can provide up to a 69% delay reduction in 22 nm process technology, and the optimal design method decreases delay by 21% and 29% on average compared to non-optimized multi-walled and single-walled CNT bundles. We also find that future CNT bundle fabrication processes must achieve a nanotube area coverage of at least 30% for optimized CNT bundles and 40% for non-optimized CNT bundles to obtain competitive performance results compared to copper interconnect. ©2008 IEEE.
AB - As CMOS technology is pushed to its basic physical limits, alternate technologies are required for the realization of interconnect in future high performance integrated circuits. In this paper, we develop a generalized design technique for carbon nanotube (CNT) bundle-based interconnect, which we use to examine the performance limits and fabrication requirements for future nanotube-based interconnect solutions. The results indicate that optimized nanotube bundles can provide up to a 69% delay reduction in 22 nm process technology, and the optimal design method decreases delay by 21% and 29% on average compared to non-optimized multi-walled and single-walled CNT bundles. We also find that future CNT bundle fabrication processes must achieve a nanotube area coverage of at least 30% for optimized CNT bundles and 40% for non-optimized CNT bundles to obtain competitive performance results compared to copper interconnect. ©2008 IEEE.
UR - http://ieeexplore.ieee.org/document/4541537/
UR - http://www.scopus.com/inward/record.url?scp=51749098761&partnerID=8YFLogxK
U2 - 10.1109/ISCAS.2008.4541537
DO - 10.1109/ISCAS.2008.4541537
M3 - Conference contribution
SN - 9781424416844
SP - 792
EP - 795
BT - Proceedings - IEEE International Symposium on Circuits and Systems
ER -