Photoresist templates for wafer-scale defect-free evaporative lithography

Xiaosong Tang; Sean J. O'Shea; Ivan U. Vakarelski

doi:10.1002/adma.201002644

Photoresist templates for wafer-scale defect-free evaporative lithography

Xiaosong Tang, Sean J. O'Shea, Ivan U. Vakarelski

Physical Sciences and Engineering

Research output: Contribution to journal › Article › peer-review

17 Scopus citations

Abstract

A highly efficient evaporative lithography method for wafer-scale patterning of microwire networks is introduced. The method is based on the use of a photolithography defined photoresist as the template for the evaporative self-assembly of nanoparticles contained in liquid suspensions. An example application is given showing the patterning of conducting-transparent microwire coating composed of gold nanoparticles that outperform standard ITO coatings.

Original language	English (US)
Pages (from-to)	5150-5153
Number of pages	4
Journal	Advanced Materials
Volume	22
Issue number	45
DOIs	https://doi.org/10.1002/adma.201002644
State	Published - Dec 1 2010

Keywords

Evaporative Self-assembly
Gold Nanoparticles
Transparent-Conducting Films

ASJC Scopus subject areas

General Materials Science
Mechanics of Materials
Mechanical Engineering

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10.1002/adma.201002644

Cite this

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abstract = "A highly efficient evaporative lithography method for wafer-scale patterning of microwire networks is introduced. The method is based on the use of a photolithography defined photoresist as the template for the evaporative self-assembly of nanoparticles contained in liquid suspensions. An example application is given showing the patterning of conducting-transparent microwire coating composed of gold nanoparticles that outperform standard ITO coatings.",

keywords = "Evaporative Self-assembly, Gold Nanoparticles, Transparent-Conducting Films",

author = "Xiaosong Tang and O'Shea, {Sean J.} and Vakarelski, {Ivan U.}",

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AU - O'Shea, Sean J.

AU - Vakarelski, Ivan U.

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Y1 - 2010/12/1

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AB - A highly efficient evaporative lithography method for wafer-scale patterning of microwire networks is introduced. The method is based on the use of a photolithography defined photoresist as the template for the evaporative self-assembly of nanoparticles contained in liquid suspensions. An example application is given showing the patterning of conducting-transparent microwire coating composed of gold nanoparticles that outperform standard ITO coatings.

KW - Evaporative Self-assembly

KW - Gold Nanoparticles

KW - Transparent-Conducting Films

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ER -

Photoresist templates for wafer-scale defect-free evaporative lithography

Abstract

Keywords

ASJC Scopus subject areas

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