Polishing of anaerobic secondary effluent by Chlorella vulgaris under low light intensity

Keyphrases

• Effluent Polishing 100%
• Microalgal Biomass 100%
• Microalgal Growth 100%
• Low Light Intensity 100%
• Organics Release 50%
• Column Reactor 50%
• Bubble Column 50%
• Hexane Extractable Materials 50%
• Generation Time 50%
• Nitrogen Deficiency 50%
• Phosphorus Content 50%
• Synthetic Effluent 50%

Engineering

• Chlorella vulgaris 100%
• Microalgal Biomass 100%
• Mols 50%
• Phosphorus Removal 50%
• Microalgae 50%
• Anaerobic Membrane Bioreactor 50%
• Phosphorus Content 50%
• Ultrafiltration 50%
• Inhibition 50%
• Grease 50%
• Chemical Oxygen Demand 50%

Chemical Engineering

• Ultrafiltration 100%
• Hexane 100%
• Biochemical Reactor 100%
• Nitrogen Removal 100%