Abstract
We present the first results of microstructure replica with re-usable masters in poly vinyl alcohol (PVA). Microneedles of heights ranging from 500 to 1100 μm were fabricated through double-exposure deep X-ray lithography (DXRL) process and successfully replicated. A single PVA master was used as a template to successfully replicate up to 10 PMMA microneedle arrays, suggesting that this method might be a possible alternative to PDMS processes. A preliminary characterization of the relationship between the surface roughness of the substrates and the force required for demoulding was also performed.
Original language | English (US) |
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Pages (from-to) | 752-756 |
Number of pages | 5 |
Journal | Microelectronic Engineering |
Volume | 86 |
Issue number | 4-6 |
DOIs | |
State | Published - Apr 2009 |
Externally published | Yes |
Keywords
- DXRL
- Microneedles
- PMMA
- PVA
- Soft lithography
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering