TY - JOUR
T1 - Positive Tone Nanoparticle Photoresists: New Insight on the Patterning Mechanism
AU - Yu, Mufei
AU - Xu, Hong
AU - Kosma, Vasiliki
AU - Odent, Jeremy
AU - Kasahara, Kazuki
AU - Giannelis, Emmanuel
AU - Ober, Christopher
N1 - KAUST Repository Item: Exported on 2022-05-26
Acknowledgements: The authors gratefully acknowledge financial support by JSR, and access to the facilities of the Cornell Nanoscale Science and Technology Facility (CNF) and the KAUST-Cornell Center of Energy and Sustainability (KAUST_CU).
This publication acknowledges KAUST support, but has no KAUST affiliated authors.
PY - 2016
Y1 - 2016
N2 - Methacrylate based nanoparticle materials have been investigated for their negative-tone patterning with DUV (248nm, 254nm), e-beam and EUV lithography, and show promising EUV sensitivity and resolution. In order to further extend the application of this novel class of materials and understand more about the underlying mechanism, we continue to study its dual-tone behavior and the tone-switching process. Catalyzed by a photoradical generator, we have been able to print positive tone line-space patterns with both DUV and e-beam exposure enabled patterning of features with a wide range of line-widths. By monitoring the patterning process, the PEB conditions have been found to be a crucial factor, which determines the solubility and core-ligand interactions.
AB - Methacrylate based nanoparticle materials have been investigated for their negative-tone patterning with DUV (248nm, 254nm), e-beam and EUV lithography, and show promising EUV sensitivity and resolution. In order to further extend the application of this novel class of materials and understand more about the underlying mechanism, we continue to study its dual-tone behavior and the tone-switching process. Catalyzed by a photoradical generator, we have been able to print positive tone line-space patterns with both DUV and e-beam exposure enabled patterning of features with a wide range of line-widths. By monitoring the patterning process, the PEB conditions have been found to be a crucial factor, which determines the solubility and core-ligand interactions.
UR - http://hdl.handle.net/10754/678252
UR - https://www.jstage.jst.go.jp/article/photopolymer/29/3/29_509/_article
UR - http://www.scopus.com/inward/record.url?scp=84982871898&partnerID=8YFLogxK
U2 - 10.2494/photopolymer.29.509
DO - 10.2494/photopolymer.29.509
M3 - Article
SN - 0914-9244
VL - 29
SP - 509
EP - 512
JO - Journal of Photopolymer Science and Technology
JF - Journal of Photopolymer Science and Technology
IS - 3
ER -