Proximity correction for e-beam patterned sub-500nm diffractive optical elements

L. Grella*, Enzo Di Fabrizio, M. Gentili, M. Baciocchi, R. Maggiora

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Scopus citations


In this paper we present two important issues often demanded when patterning DOEs using EBL: the first one is the attainment of accurate resist three-dimensional shaping to increase DOE efficiency, this task is accomplished by developing a new proximity correction algorithm able to shape the resist in one shot of exposure. The second one is the proximity-effect correction of optical gratings having an axial symmetry, whose application is the microfabrication of Fresnel Zone Plates (FZPs); this problem requires the development of a specific algorithm that minimises the computation load by exploiting the grating symmetry. A description of these algorithms is given and examples of proximity compensated DOEs are presented.

Original languageEnglish (US)
Pages (from-to)495-498
Number of pages4
JournalMicroelectronic Engineering
Issue number1-4
StatePublished - Jan 1 1997

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


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