Abstract
A quadruple reduction of threshold current density was achieved for electrically pumped quantum-dot micro-rings epitaxially grown on (001) silicon. This was enabled by a low threading dislocation density GaAs buffer layer and a smoothed etching sidewall.
Original language | English (US) |
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Title of host publication | Optics InfoBase Conference Papers |
Publisher | Optica Publishing Group (formerly OSA) |
ISBN (Print) | 9781943580422 |
DOIs | |
State | Published - Jan 1 2018 |
Externally published | Yes |