Rapid patterning of single-wall carbon nanotubes by interlayer lithography

Dong Seok Leem; Sungsoo Kim; Ji Whan Kim; Jung Inn Sohn; Angharad Edwards; Jingsong Huang; Xuhua Wang; Jang Joo Kim; Donal D.C. Bradley; John C. Demello

doi:10.1002/smll.201000971

Rapid patterning of single-wall carbon nanotubes by interlayer lithography

Dong Seok Leem, Sungsoo Kim, Ji Whan Kim, Jung Inn Sohn, Angharad Edwards, Jingsong Huang, Xuhua Wang, Jang Joo Kim, Donal D.C. Bradley, John C. Demello

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

High resolution patterning of single-wall carbon nanotubes is achieved using interlayer lithography. Minimum feature sizes of 6 and 0.7 μm are demonstrated on glass and silicon, using the negative photoresist SU-8 and the positive photoresist AZ7220, respectively. Films patterned using SU-8 have a good balance of transparency and sheet-resistance, and are shown to be effective electrodes for organic solar cells. Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Original language	English (US)
Journal	Small
Volume	6
Issue number	22
DOIs	https://doi.org/10.1002/smll.201000971
State	Published - Nov 22 2010
Externally published	Yes

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title = "Rapid patterning of single-wall carbon nanotubes by interlayer lithography",

abstract = "High resolution patterning of single-wall carbon nanotubes is achieved using interlayer lithography. Minimum feature sizes of 6 and 0.7 μm are demonstrated on glass and silicon, using the negative photoresist SU-8 and the positive photoresist AZ7220, respectively. Films patterned using SU-8 have a good balance of transparency and sheet-resistance, and are shown to be effective electrodes for organic solar cells. Copyright {\textcopyright} 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.",

author = "Leem, {Dong Seok} and Sungsoo Kim and Kim, {Ji Whan} and Sohn, {Jung Inn} and Angharad Edwards and Jingsong Huang and Xuhua Wang and Kim, {Jang Joo} and Bradley, {Donal D.C.} and Demello, {John C.}",

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AU - Leem, Dong Seok

AU - Kim, Sungsoo

AU - Kim, Ji Whan

AU - Sohn, Jung Inn

AU - Edwards, Angharad

AU - Huang, Jingsong

AU - Wang, Xuhua

AU - Kim, Jang Joo

AU - Bradley, Donal D.C.

AU - Demello, John C.

N1 - Generated from Scopus record by KAUST IRTS on 2019-11-27

PY - 2010/11/22

Y1 - 2010/11/22

N2 - High resolution patterning of single-wall carbon nanotubes is achieved using interlayer lithography. Minimum feature sizes of 6 and 0.7 μm are demonstrated on glass and silicon, using the negative photoresist SU-8 and the positive photoresist AZ7220, respectively. Films patterned using SU-8 have a good balance of transparency and sheet-resistance, and are shown to be effective electrodes for organic solar cells. Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

AB - High resolution patterning of single-wall carbon nanotubes is achieved using interlayer lithography. Minimum feature sizes of 6 and 0.7 μm are demonstrated on glass and silicon, using the negative photoresist SU-8 and the positive photoresist AZ7220, respectively. Films patterned using SU-8 have a good balance of transparency and sheet-resistance, and are shown to be effective electrodes for organic solar cells. Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

UR - http://doi.wiley.com/10.1002/smll.201000971

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M3 - Article

SN - 1613-6810

VL - 6

JO - Small

JF - Small

IS - 22

ER -

Rapid patterning of single-wall carbon nanotubes by interlayer lithography

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