Reaction of diamond thin films with atomic oxygen simulated as low-earth-orbit environment

Jingqi Li; Qing Zhang; S. F. Yoon; J. Ahn; Qiang Zhou; Sigen Wang; Dajiang Yang; Qiang Wang; Zhonghua Li; Jingyi Wang; Qingsong Lei

doi:10.1063/1.1513211

Reaction of diamond thin films with atomic oxygen simulated as low-earth-orbit environment

Jingqi Li^*, Qing Zhang, S. F. Yoon, J. Ahn, Qiang Zhou, Sigen Wang, Dajiang Yang, Qiang Wang, Zhonghua Li, Jingyi Wang, Qingsong Lei

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

8 Citations (SciVal)

Abstract

Diamond thin films deposited using a hot filament chemical vapor deposition (CVD) technique have been explored to atomic oxygen simulated as low-earth-orbit environment to examine their erosion-resistance properties. X-ray photoelectron spectroscopy results suggest that the atomic oxygen reacts with the diamond surface and forms ether (C-O-C) and carbonyl (>C=O) configurations. After a 3 h exposure to the atomic oxygen beam with a flux of 2.6×10 ¹⁶ atoms/cm ²s, the diamond films only show a small mass loss with a reaction efficiency of 8.28×10 ^-26 cm ³/atom. Such a small reaction efficiency suggests that the CVD diamond is highly erosion resistive to atomic oxygen and it can be used as a passivation material in space.

Original language	English (US)
Pages (from-to)	6275-6277
Number of pages	3
Journal	Journal of Applied Physics
Volume	92
Issue number	10
DOIs	https://doi.org/10.1063/1.1513211
State	Published - Nov 15 2002

ASJC Scopus subject areas

Physics and Astronomy(all)

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title = "Reaction of diamond thin films with atomic oxygen simulated as low-earth-orbit environment",

abstract = "Diamond thin films deposited using a hot filament chemical vapor deposition (CVD) technique have been explored to atomic oxygen simulated as low-earth-orbit environment to examine their erosion-resistance properties. X-ray photoelectron spectroscopy results suggest that the atomic oxygen reacts with the diamond surface and forms ether (C-O-C) and carbonyl (>C=O) configurations. After a 3 h exposure to the atomic oxygen beam with a flux of 2.6×10 16 atoms/cm 2s, the diamond films only show a small mass loss with a reaction efficiency of 8.28×10 -26 cm 3/atom. Such a small reaction efficiency suggests that the CVD diamond is highly erosion resistive to atomic oxygen and it can be used as a passivation material in space.",

author = "Jingqi Li and Qing Zhang and Yoon, {S. F.} and J. Ahn and Qiang Zhou and Sigen Wang and Dajiang Yang and Qiang Wang and Zhonghua Li and Jingyi Wang and Qingsong Lei",

year = "2002",

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doi = "10.1063/1.1513211",

language = "English (US)",

volume = "92",

pages = "6275--6277",

journal = "Journal of Applied Physics",

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TY - JOUR

T1 - Reaction of diamond thin films with atomic oxygen simulated as low-earth-orbit environment

AU - Li, Jingqi

AU - Zhang, Qing

AU - Yoon, S. F.

AU - Ahn, J.

AU - Zhou, Qiang

AU - Wang, Sigen

AU - Yang, Dajiang

AU - Wang, Qiang

AU - Li, Zhonghua

AU - Wang, Jingyi

AU - Lei, Qingsong

PY - 2002/11/15

Y1 - 2002/11/15

N2 - Diamond thin films deposited using a hot filament chemical vapor deposition (CVD) technique have been explored to atomic oxygen simulated as low-earth-orbit environment to examine their erosion-resistance properties. X-ray photoelectron spectroscopy results suggest that the atomic oxygen reacts with the diamond surface and forms ether (C-O-C) and carbonyl (>C=O) configurations. After a 3 h exposure to the atomic oxygen beam with a flux of 2.6×10 16 atoms/cm 2s, the diamond films only show a small mass loss with a reaction efficiency of 8.28×10 -26 cm 3/atom. Such a small reaction efficiency suggests that the CVD diamond is highly erosion resistive to atomic oxygen and it can be used as a passivation material in space.

AB - Diamond thin films deposited using a hot filament chemical vapor deposition (CVD) technique have been explored to atomic oxygen simulated as low-earth-orbit environment to examine their erosion-resistance properties. X-ray photoelectron spectroscopy results suggest that the atomic oxygen reacts with the diamond surface and forms ether (C-O-C) and carbonyl (>C=O) configurations. After a 3 h exposure to the atomic oxygen beam with a flux of 2.6×10 16 atoms/cm 2s, the diamond films only show a small mass loss with a reaction efficiency of 8.28×10 -26 cm 3/atom. Such a small reaction efficiency suggests that the CVD diamond is highly erosion resistive to atomic oxygen and it can be used as a passivation material in space.

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U2 - 10.1063/1.1513211

DO - 10.1063/1.1513211

M3 - Article

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VL - 92

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EP - 6277

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 10

ER -

Reaction of diamond thin films with atomic oxygen simulated as low-earth-orbit environment

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