Realization of large-scale photonic crystal cavity-based devices

Amit Kumar Goyal, Hemant Sankar Dutta, Sumitra Singh, Mandeep Kaur, Sudhir Husale, Suchandan Pal

Research output: Contribution to journalArticlepeer-review

18 Scopus citations


This paper demonstrates an approach for fabricating large-scale photonic crystal (PhC)-based devices using a combination of optical and focused ion beam (FIB) lithography techniques. Optical lithography along with reactive ion etching parameters is optimized to realize the layout of device structure and thereafter FIB milling is optimized to realize the designed PhC structure at those identified locations. At first, with the help of a specially designed mask and using optical lithography along with reactive ion etching, a number of rectangular areas of dimension of 10 μm×20 μm along with input and output waveguides of width ∼700 nm and thickness of ∼250 nm have been fabricated. Subsequently, use of FIB milling, a periodic PhC structure of lattice constant of 600 nm, having a hole diameter of ∼480 nm along with a defect hole diameter of ∼250 nm have been realized successfully on the selected areas. This method shows a promising application in fabricating PhC structure with device size >1 cm2 at large scale, eliminating the problems of standard nanolithography techniques.
Original languageEnglish (US)
JournalJournal of Micro/ Nanolithography, MEMS, and MOEMS
Issue number3
StatePublished - Jul 1 2016
Externally publishedYes

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Mechanical Engineering
  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering
  • Condensed Matter Physics


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