Reduced graphene oxide electrodes for large area organic electronics

Paul H. Wöbkenberg; Goki Eda; Dong Seok Leem; John C. De Mello; Donal D.C. Bradley; Manish Chhowalla; Thomas D. Anthopoulos

doi:10.1002/adma.201004161

Reduced graphene oxide electrodes for large area organic electronics

Paul H. Wöbkenberg, Goki Eda, Dong Seok Leem, John C. De Mello, Donal D.C. Bradley, Manish Chhowalla, Thomas D. Anthopoulos

Research output: Contribution to journal › Article › peer-review

95 Scopus citations

Abstract

Interlayer lithography is used to pattern highly conductive, solution-processed, reduced graphene oxide source and drain electrodes down to 10 μm gaps. These patterned electrodes allow for the fabrication of high-performance organic thin-film transistors and complementary circuits. The method offers a viable route towards organic electronics fabricated entirely by solution processing.

Original language	English (US)
Pages (from-to)	1558-1562
Number of pages	5
Journal	Advanced Materials
Volume	23
Issue number	13
DOIs	https://doi.org/10.1002/adma.201004161
State	Published - Apr 5 2011
Externally published	Yes

Keywords

dielectrics
graphene
lithography
organic semiconductors
self-assembled monolayers
transistors

ASJC Scopus subject areas

General Materials Science
Mechanics of Materials
Mechanical Engineering

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10.1002/adma.201004161

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author = "W{\"o}bkenberg, {Paul H.} and Goki Eda and Leem, {Dong Seok} and {De Mello}, {John C.} and Bradley, {Donal D.C.} and Manish Chhowalla and Anthopoulos, {Thomas D.}",

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AU - Wöbkenberg, Paul H.

AU - Eda, Goki

AU - Leem, Dong Seok

AU - De Mello, John C.

AU - Bradley, Donal D.C.

AU - Chhowalla, Manish

AU - Anthopoulos, Thomas D.

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AB - Interlayer lithography is used to pattern highly conductive, solution-processed, reduced graphene oxide source and drain electrodes down to 10 μm gaps. These patterned electrodes allow for the fabrication of high-performance organic thin-film transistors and complementary circuits. The method offers a viable route towards organic electronics fabricated entirely by solution processing.

KW - dielectrics

KW - graphene

KW - lithography

KW - organic semiconductors

KW - self-assembled monolayers

KW - transistors

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ER -

Reduced graphene oxide electrodes for large area organic electronics

Abstract

Keywords

ASJC Scopus subject areas

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