Reliability of scalable MoS2 FETs with 2 nm crystalline CaF2 insulators

Yury Yu Illarionov, Alexander G. Banshchikov, Dmitry K. Polyushkin, Stefan Wachter, Theresia Knobloch, Mischa Thesberg, Mikhail I. Vexler, Michael Waltl, Mario Lanza, Nikolai S. Sokolov, Thomas Mueller, Tibor Grasser

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