Repair Engineering of Crystal Structure in van der Waals Materials by Probe Electron Beam

Nan Wang, Shiyang Wei, Xia Deng, Tao Wang, Yaxing Zhang, Xinrui Zhao, Wang Hu, Xue Zeng, Chuang Ye, Xiaoke Mu, Junwei Zhang*, Laiyuan Wang*, Xixiang Zhang, Zhe Wang, Peng Zhang, Yong Peng*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The advancement of electronic technology has led to increasing research on performance and stability. Continuous electrical pulse stimulation can cause crystal structure changes, affecting performance and accelerating aging. Controlled repair of these defects is crucial. In this study, we investigated crystal structure changes in van der Waals (vdW) InSe crystals under continuous electric pulses by using electron beam lithography (EBL) and spherical aberration corrected transmission electron microscopy (Cs-TEM). Results show that electrical pulses induce amorphous regions in the InSe lattice, increasing the device resistance. We used Cs-STEM probe scanning for precise repair, abbreviated SPRT, to optimize device performance. SPRT is related to electric fields induced by the electron beam and can be applied to other 2D materials like α-In2Se3 and CrSe2, offering a potential approach to extend device lifespan.

Original languageEnglish (US)
JournalNano Letters
DOIs
StateAccepted/In press - 2024

Keywords

  • defects
  • electrical pulses
  • probe electron beam
  • repair engineering
  • van der Waals layered materials

ASJC Scopus subject areas

  • Bioengineering
  • General Chemistry
  • General Materials Science
  • Condensed Matter Physics
  • Mechanical Engineering

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