Abstract
We introduce simple double-casting replication methods for high-aspect-ratio microstructures fabricated by deep x-ray lithography using intermediate molds of soft materials. Two types of soft material are investigated. The ability to fabricate polymethylsiloxane (PDMS) molds with well-type structures with aspect ratios up to 35:1 is demonstrated for structure densities below 50%, and the reproduction from this mold of pillar-type polymethyl methacrylate (PMMA) structures with aspect ratios of 20: 1 is achieved. Polyvinyl alcohol (PVA), a water soluble polymer, is also tested as a sacrificial intermediate mold and successfully used for the replication of structures with aspect ratios up to 5:1. Double-casting replication methods are described and discussed for their potential improvement.
Original language | English (US) |
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Article number | 011007 |
Journal | Journal of Microlithography, Microfabrication and Microsystems |
Volume | 5 |
Issue number | 1 |
DOIs | |
State | Published - Jan 2006 |
Externally published | Yes |
Keywords
- Deep x-ray lithography
- Double casting
- High aspect ratio
- Polydimethylsiloxane
- Polyvinyl alcohol
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering