Role of nitrogen in the formation of HC-N films by CH₄/N ₂ barrier discharge plasma: Aliphatic tendency

Keyphrases

• Barrier Discharge Plasma 100%
• Unpolarized 50%
• Nitrogen Partial Pressure 50%
• Molecular Bands 50%
• Proton NMR 50%
• Ta-CNx 50%
• Nitrile Group 50%
• High Nitrogen Concentration 50%
• Hydrogenated Carbon 50%
• Isonitrile 50%

Material Science

• Film 100%
• Elemental Analysis 50%
• Dielectric Material 25%
• Covalent Modification 25%
• X-Ray Photoelectron Spectroscopy 25%
• Nuclear Magnetic Resonance 25%
• Carbon Nitride 25%
• Absorption Spectrum 25%