Abstract
In this paper we report results obtained in the fabrication and use of novel coded diffractive nano-optics that, beyond focusing, can perform new optical functions. In particular, the intensity of light in the space beyond the optical elements can be redistributed with almost complete freedom. These novel X-ray optical elements have been tested and found to perform multi-focusing in single or multiple focal planes and beam shaping of a generic monochromatic beam into a desired continuous geometrical pattern. Already available extreme ultraviolet and X-ray sources are suitable as ideal sources for such diffractive optical elements. Their new optical functions have been tested in differential interference contrast microscopy and we suggest their use also in maskless lithography and chemical vapour deposition induced by extreme ultraviolet and X-ray radiation.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 87-95 |
| Number of pages | 9 |
| Journal | Microelectronic Engineering |
| Volume | 67-68 |
| DOIs | |
| State | Published - Jun 2003 |
| Externally published | Yes |
| Event | Proceedings of the 28th International Conference on MNE - Lugano, Switzerland Duration: Sep 16 2002 → Sep 19 2002 |
Keywords
- Coded diffractive optical element
- Nano-optics
- X-Ray beamshaping
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering