Silicon nanocrystal formation in annealed silicon-rich silicon oxide films prepared by plasma enhanced chemical vapor deposition

N. Daldosso*, G. Das, S. Larcheri, G. Mariotto, G. Dalba, L. Pavesi, A. Irrera, F. Priolo, F. Iacona, F. Rocca

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

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