Silicon Nanocrystal Nucleation as a Function of the Annealing Temperature in SiOx Films

N. Daldosso*, G. Das, G. Dalba, S. Larcheri, R. Grisenti, G. Mariotto, L. Pavesi, F. Rocca, F. Priolo, G. Franzò, A. Irrera, M. Miritello, D. Pacifici, F. Iacona

*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

2 Scopus citations

Fingerprint

Dive into the research topics of 'Silicon Nanocrystal Nucleation as a Function of the Annealing Temperature in SiOx Films'. Together they form a unique fingerprint.

Engineering

Material Science

Physics

Keyphrases

Chemical Engineering