Simulation of chemically amplified resist processes for 150 nm e-beam lithography

A. Rosenbusch*, Z. Cui, E. DiFabrizio, M. Gentili, N. Glezos, G. Meneghini, B. Nowotny, G. Patsis, P. Prewett, I. Raptis

*Corresponding author for this work

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Engineering

Earth and Planetary Sciences

Medicine and Dentistry

Material Science