Simulation of chemically amplified resist processes for 150 nm e-beam lithography

A. Rosenbusch*, Z. Cui, E. DiFabrizio, M. Gentili, N. Glezos, G. Meneghini, B. Nowotny, G. Patsis, P. Prewett, I. Raptis

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

10 Scopus citations

Fingerprint

Dive into the research topics of 'Simulation of chemically amplified resist processes for 150 nm e-beam lithography'. Together they form a unique fingerprint.

Engineering

Earth and Planetary Sciences

Medicine and Dentistry

Material Science